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AssigneeSumitomo Chemical Company, Limited
InventorsYasunori Uetani, Takakiyo Terakawa, Kaoru Araki
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A chemical amplification type positive resist composition is provided, comprising a resin which has at least one polymerization unit selected from a polymerization unit of 3-hydroxy-1-adamantyl acrylate and a polymerization unit of 3,5-dihydroxy-1-adamantyl (meth)acrylate, a polymerization unit of hydroxystyrene and a polymerization unit having a group uhstable to an acid, is itself insoluble or poorly soluble in an alkali but becomes alkali-soluble after said group unstable to an acid is dissociated by the action of an acid; and an acid generator, the composition being excellent in various abilities such as sensitivity, resolution, heat resistance, film retention ratio, applicability, exposure clearance, dry etching resistance and the like, particularly having further improved resolution and exposure clearance.
A chemical amplification type positive resist composition comprising a resin which has, at least one polymerization unit selected from a polymerization unit of 3-hydroxy-1-adamantyl acrylate and a polymerization unit of 3,5-dihydroxy-1-adamantyl (meth)acrylate, a polymerization unit of hydroxystyrene, and a polymerization unit having a group unstable to an acid, and is itself insoluble or poorly soluble in an alkali but becomes alkali-soluble after the above-mentioned group unstable to an acid is dissociated by the action of an acid:
Dependencies are inferred from the claim text.