Resist compositions and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Youichi Ohsawa, Tomohiro Kobayashi
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Abstract
In a resist composition comprising a base resin which is a high molecular weight structure free from an aromatic substituent group, a photoacid generator, and a solvent, the photoacid generator is a one capable of generating a perfluoroalkyl ether sulfonic acid. The resist composition has many advantages including excellent resolution, minimized size difference between isolated and densely packed patterns, and minimized line edge roughness.
Claims11
A resist composition comprising a base resin which is a high molecular weight structure free from an aromatic substituent group, a photoacid generator, and a solvent,
- said photoacid generator comprising a photoacid generator capable of generating a perfluoroalkyl ether sulfonic acid.
Dependencies are inferred from the claim text.