Methods using dry powder deposition apparatuses

A dry deposition apparatus for depositing grains on a substrate comprising:

• an electrostatic chuck having one or more collection zones, wherein the substrate is layered on the chuck for processing;
• a charged grain delivery apparatus for directing charged grains for electrostatic deposition on the substrate at locations corresponding to the locations of the collection zones;
• a electronic processor for controlling depositions;
• and
• sensor inputs to the electronic processor including one or more deposition sensors placed on or adjacent to the electrostatic chuck for measuring the amount of grains deposited at the deposition sensors;
• wherein the electronic processor responds to data from the sensors to adjust current deposition parameters including flux of grains through the grain delivery apparatus and voltages applied at one or more collection zones to attract grains.

A dry deposition apparatus for depositing grains on a substrate comprising:

• an electrostatic chuck, wherein the substrate is layered on the chuck for processing;
• and
• a grain feed apparatus comprising:
• a tube for delivering grains towards the electrostatic chuck;
• a mechanical device for moving the grains having an outlet for inserting grains towards the tube;
• and
• one or more of:
• a gas driven Venturi having a Venturi well for pulling grains from the mechanical device and propelling, with the gas, the grains through the tube, or
• a gas source for directing gas towards the outlet of the mechanical device to separate grains and provide gas flow propelling grains through the tube.

A dry deposition apparatus for depositing grains on a substrate comprising:

• an electrostatic chuck, wherein the substrate is layered on the chuck for processing;
• and
• a grain feed apparatus comprising:
• a tube for delivering grains towards the electrostatic chuck;
• and
• a baffle at the outlet of the tube for enhancing uniformity of a cloud of grains directed by the grain feed apparatus towards the electrostatic chuck.

A dry deposition apparatus for depositing grains on a substrate comprising:

• an electrostatic chuck, wherein the substrate is layered on the chuck for processing;
• a grain feed apparatus for delivering grains towards the electrostatic chuck;
• and
• a powder trap for recovering grains directed to the electrostatic chuck which are not adhered thereto, comprising a series of conductive baffles, with some baffles having a positive potential and others having a negative potential.

A dry deposition apparatus for depositing grains on a substrate comprising:

• an electrostatic chuck having one or more collection zones, wherein the substrate is layered on the chuck for processing;
• a charged grain delivery apparatus for directing charged grains for electrostatic deposition on the substrate at the locations of the collection zones;
• and
• a sealing apparatus for sealing a covering substrate onto grain-coated locations of the first substrate.