Distributed bragg reflector and method of fabrication
AssigneeAgilent Technologies, Inc.
InventorsScott W. Corzine, Michael Renne Ty Tan, Chao Kun Lin, Jintian Zhu, Michael H. Leary
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Abstract
A distributed Bragg reflector and a method of fabricating the same incorporates a support for supporting the gaps against collapse. The method includes forming a plurality of alternating structure and sacrificial layers on a substrate. The structure and sacrificial layers are etched into at least one mesa protruding from the substrate. A support layer is formed on the at least one mesa leaving a portion of the structure and sacrificial layers exposed. At least a portion of at least one of the exposed sacrificial layers are etched from between the structure layers to form gaps between the structure layers.
Claims20
A method of fabricating a Bragg reflector comprising:
- forming at least one structure layer and at least one sacrificial layer in alternating relation on a substrate;
- etching the structure and sacrificial layers into at least one mesa protruding from the substrate;
- forming a support layer on the at least one mesa leaving a portion of the structure and the sacrificial layers exposed;
- and
- etching at least a portion of at least one of the exposed sacrificial layers to form a gap.
A Bragg reflector comprising:
- one or more first layers adjacent one or more second layers, the first and second layers having at least one sidewall, wherein the first and second layers define one or more gaps;
- and
- a support layer formed over at a least portion of the sidewalls to support the second layers against intrusion into the one or more gaps.
A distributed Bragg reflector comprising:
- a substrate;
- a plurality structure layers on the substrate each spaced apart by a gap, the structure layers each having edges;
- and
- a support layer about a portion of the edges for supporting the structure layers.
Dependencies are inferred from the claim text.