Laser beam irradiating apparatus, laser beam irradiating method, and method of manufacturing a semiconductor device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorKoichiro Tanaka
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AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorKoichiro Tanaka
Estimating the term…
A laser beam irradiating apparatus comprising, a plurality of lasers, member for synthesizing a plurality of laser beams emitted respectively from the plurality of lasers into a single laser beam on a stage, and member for moving the synthesized laser beam on the stage while keeping a specific shape thereof. A semiconductor film can be crystallized or an impurity element doped therein can be activated by irradiating a laser beam to the semiconductor film from the laser beam irradiating apparatus arranged as above. Consequently, it is possible to provide a laser beam irradiating apparatus capable of achieving uniform annealing efficiently by employing an optical system simpler than a conventional one and using laser beams having attenuated regions. Also, it is possible to provide a method of irradiating a laser beam using the laser beam irradiating apparatus, and to provide a method of manufacturing a semiconductor device including the laser beam irradiating method in the fabrication sequence thereof.
A laser beam irradiating apparatus, comprising:
A laser beam irradiating apparatus, comprising:
A laser beam irradiating apparatus, comprising:
A laser beam irradiating apparatus, comprising:
A method of irradiating a laser beam, comprising:
A method of irradiating a laser beam, comprising:
A method of irradiating a laser beam, comprising:
A method of irradiating a laser beam, comprising:
Dependencies are inferred from the claim text.