Microdisplay pixel cell and method of making it

A method for making a microdisplay pixel cell, the method comprising:

• providing a semiconductor substrate defined with a plurality of active areas;
• forming a gate oxide layer and a gate conductive layer sequentially on the semiconductor substrate;
• performing a photo-etching-process (PEP) to the gate conductive layer to form at least one gate on the semiconductor substrate and the gate covering a portion of the active area;
• forming a plurality of source/drain (S/D) in the active area not covered by the gate;
• forming a first dielectric layer on the semiconductor substrate to cover the gate and the source/drain;
• forming at least one row select contact plug in the first dielectric layer to electrically connect to the gate;
• forming at least one row select line atop the first dielectric layer, the row select line being electrically connected to the gate through the row select contact plug;
• forming a second dielectric layer atop the first dielectric layer and covering the row select line;
• forming at least one pixel cap top plate atop the second dielectric layer;
• forming a capacitor dielectric layer atop the surface of the top plate;
• and
• forming at least one pixel cap bottom plate atop the second dielectric layer and covering the top plate.