Infrared light detection array and method of producing the same

An infrared light detection array with a plurality of infrared light detectors arranged on a substrate in the form of a matrix, said infrared light detectors each comprising:

• a) a supporting leg fixed to said substrate on one end, having a laminated structure of an insulation layer and a wiring layer;
• b) a heat insulation structure portion supported by said supporting leg, comprising an insulation layer having a first surface for infrared light to impinge upon and a second surface for reading light to impinge upon, a half-mirror layer to transmit a portion of said reading light but reflect the other portion of said reading light, and a resistor connected with said wiring layer;
• and
• c) a mirror layer disposed on said substrate to reflect said reading light transmitted through said half-mirror layer and causes said reading light reflected by said half-mirror layer to interfere with said reading light reflected by said mirror layer to thereby create interference light,
• and as said supporting legs heated up to a detection temperature by said infrared light reversibly warp, said infrared light detectors change the light intensity of said interference light,
• wherein said supporting legs non-reversibly warp, as said resistors carry a current through said wiring layers and said supporting legs are heated up to a temperature which is higher than said detection temperature.

A method of producing an infrared light detection array with a plurality of infrared light detectors arranged on a substrate in the form of a matrix, comprising:

• a step of preparing a substrate;
• a step of depositing a sacrificial layer on said substrate;
• a step of forming insulation layers to define heat insulation structure portion areas and supporting leg areas on said sacrificial layer;
• a resistor forming step of forming resistors in said heat insulation structure portion areas of said insulation layers;
• a reflection film forming step of forming reflection films on said resistors;
• an annealing step of heating said substrate forming said reflection films to a predetermined annealing temperature;
• a step of forming a wiring layer connected with said resistors on said supporting leg areas of said insulation layers after said annealing step;
• and
• a step of removing said sacrificial layer and producing said infrared light detectors with said heat insulation structure portions supported on said substrate by said supporting legs comprised of said insulation layers and said wiring layers,
• wherein said method further comprising a correction step of causing said resistors included in said infrared light detectors to carry a current after said infrared light detectors are formed and heating up said resistors to a temperature lower than said annealing temperature, so that said supporting legs non-reversibly warp and the supporting angles of said reflection films with respect to said substrate become approximately uniform among all of said infrared light detectors.