Method of fabricating and a device that includes nanosize pores having well controlled geometries
AssigneeAgilent Technologies, Inc.
InventorsDaniel B. Roitman, Dietrich W. Vook, Theodore I. Kamins
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AssigneeAgilent Technologies, Inc.
InventorsDaniel B. Roitman, Dietrich W. Vook, Theodore I. Kamins
Estimating the term…
A method of fabricating nanosized holes with controlled geometries employs tools and methods developed in the microelectronics industry. The method exploits the fact that epitaxially grown film thicknesses can be controlled within a few atomic monolayers and that by using etching techniques, trenches and channels can be created that are only a few nanometers wide. The method involves bonding two shallow channels at an angle such that a nanopore is defined by the intersection. Thus, a nanopore-defining device includes a nanopore with dimensions that are determined by the dimensions and orientations of the intersecting channels, with the dimensions being accurately controlled within a few monolayers.
A method of manufacturing pores having controlled geometries and locations comprising the steps of:
A method of forming a nanopore comprising the steps of:
A method of forming an opening having a well controlled geometry comprising the steps of:
A nanopore-defining device comprising:
A method of forming a pore comprising the steps of:
Dependencies are inferred from the claim text.