Reaction chamber with at least one HF feedthrough

Abstract

The invention relates to a reaction chamber especially for carrying out substrate coating methods, such as CVD methods, characterized in that at least one opening is provided in at least one outer wall in which an HF and especially an RF feedthrough is inserted in a pressure or vacuum tight manner. The inventive reaction chamber is further characterized by a combination of the following features: a support plate is sealingly inserted in every opening; the support plate has at least one opening for an HF line; every HF line is provided with a collar in the zone disposed in the reaction chamber, a first seal being mounted on said collar; a first disc from an insulating material is inserted between a second seal on the support plate and the first seal on the collar; a thread is provided in the zone outside the reaction chamber of every HF line, a screw element being screwed onto said thread in such a manner that it sealingly forces the collar of the HF line against the insulating disc via the first seal and said disc against the support plate via the second seal, without an electrical contact between the HF line and the support plate being established or an arc-over between the HF line and the support plate occurring.

Dependencies are inferred from the claim text.