Method of manufacturing an optical core
AssigneeApplied Materials, Inc., a Delaware corporation
InventorsHichem M'Saad, Anchuan Wang
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AssigneeApplied Materials, Inc., a Delaware corporation
InventorsHichem M'Saad, Anchuan Wang
Estimating the term…
Embodiments of the present invention provide a highly uniform low cost production worthy solution for manufacturing low propagation loss optical waveguides on a substrate. The method comprises depositing an optical core using a high-density plasma deposition process. The method is particularly advantageous in forming high contrast refractive index optical cores, such as SiOxNy, with drastically reduced propagation loss. In one embodiment the high-density plasma deposition process is an HDP-CVD process. In another embodiment the high-density plasma deposition process is an HDP-ECR process. In one embodiment, a method of forming an optical waveguide comprises forming at least one optical core on an undercladding layer of a substrate using a high-density plasma deposition process.
A method of forming an optical waveguide on an undercladding layer of a substrate, the method comprising:
A method of depositing an optical core on a substrate in a processing chamber comprising:
A substrate processing system comprising:
A computer-readable storage medium having a computer-readable program embodied therein for directing operation of a substrate processing system including a process chamber;
Dependencies are inferred from the claim text.