High temperature polymer filtration medium
AssigneeBHA Group Holdings, Inc.
InventorAlan Smithies
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Abstract
A filter medium for use in particulate filtering applications is disclosed. The filter medium is formed from a substrate capable of retaining the desired physical structure of the filter medium under the conditions of the filtering application, including temperature. A polyimide based stiffening agent adapted for treating the substrate is also provided.
Claims24
A filter medium for use in a filtering application at an application temperature, the filter medium comprising:
- a substrate capable of retaining a physical structure at the application temperature;
- and
- a polyimide based stiffening agent adapted for treating the substrate.
A filter medium for use in a filtering application at an application temperature, the filter medium comprising:
- a polymer substrate capable of retaining a pleated structure at the application temperature;
- a plurality of pleats formed into the polymer substrate;
- and
- a polyimide based stiffening agent adapted for treating the polymer substrate.
A filter medium for use in a filtering application at an application temperature, the filter medium comprising:
- a polymer substrate capable of retaining a pleated structure at the application temperature;
- a plurality of pleats formed into the polymer substrate;
- and
- a polyamideimide based stiffening agent adapted for treating the polymer substrate.
A method of making a filter medium comprising:
- providing a substrate;
- calendering the substrate;
- providing a polyimide stiffening agent;
- treating the calendered substrate with the polyimide stiffening agent;
- and
- curing the treated substrate.
A method of making a filter medium comprising:
- providing a substrate;
- calendering the substrate;
- providing a polyimide stiffening agent;
- treating the calendered substrate with the polyimide stiffening agent;
- curing the treated substrate;
- and
- pleating the treated substrate.
Dependencies are inferred from the claim text.