Laser apparatus, laser irradiation method, manufacturing method for a semiconductor device, semiconductor device and electronic equipment

A laser apparatus comprising:

• a laser oscillation apparatus;
• means for rotating a plurality of objects to be processed on an identical plane;
• means for moving the plurality of objects to be processed toward a center of the rotation or toward an outside from the center;
• and
• means for directing a laser light to a definite region in a moving range of the object to be processed,
• wherein:
• the center of the rotation of the plurality of objects to be processed is the one identical center;
• and
• the plurality of objects to be processed are moved toward the center of the rotation or toward the outside from the center to move a position where the definite region and the plurality of objects to be processed overlap while the plurality of objects to be processed are rotated.

A laser irradiation method comprising the step of:

• processing a laser light outputted from a laser oscillation apparatus by using an optical system;
• moving an object to be processed toward a center of a rotation or toward an outside from the center while the object to be processed is rotated;
• and
• irradiating the processed laser light on a definite region in a moving range of the object to be processed.

A laser irradiation method comprising the step of:

• processing a laser light outputted from a laser oscillation apparatus by using an optical system;
• moving a plurality objects to be processed toward a center of the rotation or toward an outside from the center while the plurality of objects to be processed are rotated on the same plane;
• and
• irradiating the processed laser light on a definite region in a moving range of the plurality of objects to be processed.

A manufacturing method for a semiconductor device comprising the step of:

• processing a laser light outputted from a laser oscillation apparatus by using an optical system;
• moving a semiconductor film toward a center of the rotation or toward an outside from the center while the semiconductor film formed on an insulating surface is rotated;
• and
• irradiating the processed laser light on a definite region in a moving range of the semiconductor film to enhance crystallinity of the semiconductor film.

A manufacturing method of a semiconductor device, comprising:

• processing a laser light outputted from a laser oscillation apparatus by using an optical system;
• moving a plurality of semiconductor films toward a center of the rotation or toward an outside from the center while the plurality of semiconductor films formed on a plurality of insulating surfaces are rotated on the same plane;
• and
• irradiating the processed laser light on a definite region in a moving range of the plurality of semiconductor films to enhance crystallinity of the plurality of semiconductor films.

A semiconductor device comprising a plurality of thin film transistors having island-like semiconductor films,

• wherein:
• crystallinity is enhanced by the laser light in the island-like semiconductor films;
• and
• a shape of a locus of irradiation with the laser light formed on each of all the island-like semiconductor films is arc-shaped.

A semiconductor device comprising a plurality of thin film transistors having island-like semiconductor films,

• wherein:
• crystallinity is enhanced by the laser light in the island-like semiconductor films;
• a shape of a locus of irradiation with the laser light formed on each of all the island-like semiconductor films is arc-shaped;
• and
• grain boundary exists along the locus in each of all the island-like semiconductor films.