Semiconductor integrated circuit
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsTakahiro Ohnakado, Akihiko Furukawa
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Abstract
A semiconductor integrated circuit device includes a silicon substrate having a first region and a second region identical in conductivity to said first region and having a lower dopant concentration than said first region, a second MOS transistor formed on a main surface of said second region and configuring a radio frequency switch circuit switching on/off an input and output of a radio frequency signal, and a first MOS transistor formed on a main surface of said first region and configuring a radio frequency circuit other than said radio frequency switch circuit. There can be provided a high performance, highly reliable semiconductor integrated circuit with an RF switch circuit provided on a silicon substrate by SOPing.
Claims9
A semiconductor integrated circuit comprising:
- a silicon substrate having a first region and a second region identical in conductivity to said first region and having a lower dopant concentration than said first region;
- a second MOS transistor formed on a main surface of said second region and configuring a radio frequency switch circuit switching on/off an input and output of a radio frequency signal;
- and
- a first MOS transistor formed on a main surface of said first region and configuring a radio frequency circuit other than said radio frequency switch circuit.
Dependencies are inferred from the claim text.