Apparatus and methods for electrochemical processing of microelectronic workpieces
AssigneeSemitool, Inc.
InventorKyle M. Hanson
Life of this patent
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Abstract
A processing chamber comprising a reaction vessel having an electro-reaction cell including a virtual electrode unit, an electrode assembly disposed relative to the electro-reaction cell to be in fluid communication with the virtual electrode unit, and an electrode in the electrode assembly. The virtual electrode unit has at least one opening defining at least one virtual electrode in the electro-reaction cell. The electrode assembly can include an electrode compartment and an interface element in the electrode compartment. The interface element can be a filter, a membrane, a basket, and/or another device configured to hold the electrode. The interface element, for example, can be a filter that surrounds a basket in which the electrode is positioned.
Claims39
A processing chamber for electrochemical processing of a microelectronic workpiece, comprising:
- a reaction vessel including an electro-reaction cell configured to hold a processing solution and a virtual electrode unit in the electro-reaction cell, wherein the virtual electrode unit has an opening that defines a virtual electrode;
- an electrode assembly disposed relative to the electro-reaction cell to be in fluid communication with the virtual electrode unit, the electrode assembly including an interface element;
- and
- an electrode in the electrode assembly, wherein the interface element is between the electrode and the virtual electrode unit.
A processing chamber for electrochemical processing of a microelectronic workpiece, comprising:
- a reaction vessel including an electro-reaction cell configured to hold a processing solution at a processing site for immersing at least a portion of the workpiece in the processing solution and a virtual electrode unit in the electro-reaction cell, wherein the virtual electrode unit has an opening facing the processing site that defines a virtual electrode;
- an electrode assembly having a remote electrode compartment outside of the electro-reaction cell and an interface member in the electrode compartment;
- a fluid passageway between the electrode compartment and the electro-reaction cell;
- and
- an electrode in the electrode compartment.
A processing chamber for electrochemical processing of a microelectronic workpiece, comprising:
- a reaction vessel including an electro-reaction cell configured to hold a processing solution at a processing site for immersing at least a portion of the workpiece in the processing solution and a virtual electrode unit in the electro-reaction cell, wherein the virtual electrode unit has an opening facing the processing site that defines a virtual electrode;
- an electrode assembly having an electrode compartment disposed relative to the electro-reaction cell to be in fluid communication with the virtual electrode unit, the electrode assembly further including an interface element in the electrode compartment;
- and
- an electrode in the electrode interface element, the electrode comprising a plurality of pellets.
An integrated tool for processing microelectronic workpieces, comprising:
- a cabinet;
- a reactor in the cabinet, the reactor having a processing head configured to hold a workpiece and a processing chamber, the processing chamber comprising a reaction vessel including an electro-reaction cell configured to hold a processing solution and a virtual electrode unit including a virtual electrode in the electro-reaction cell, an electrode assembly including an interface element disposed relative to the electro-reaction cell to be in fluid communication the virtual electrode, and an electrode in the electrode assembly;
- a cleaning station in the cabinet, the cleaning station being configured to clean a workpiece;
- and
- a transfer device in the cabinet having a robotic unit for transporting the workpiece between the reactor and the cleaning station.
A reactor for processing microelectronic workpieces, comprising:
- a processing head configured to hold a workpiece;
- and
- a processing chamber, the processing chamber comprising a reaction vessel including an electro-reaction cell configured to hold a processing solution and a virtual electrode unit including a virtual electrode in the electro-reaction cell, an electrode assembly including an interface element disposed relative to the electro-reaction cell to be in fluid communication the virtual electrode, and an electrode in the electrode assembly.
A method of processing a microelectronic workpiece, comprising:
- contacting a face of the workpiece with a processing solution in an electro-reaction cell of a processing chamber, the workpiece being positioned relative to a virtual electrode of a virtual electrode unit in the electro-reaction cell;
- applying an electrical potential to the workpiece;
- applying an electrical potential to the processing solution using an electrode in remote electrode compartment outside of the electro-reaction cell such that electrons pass through the processing solution from the electrode in the remote electrode compartment to the virtual electrode in the electro-reaction cell.
Dependencies are inferred from the claim text.