Fluoro-containing photosensitive polymer and photoresist composition containing the same
AssigneeSamsung Electronics Co., Ltd.
InventorHyun-woo Kim
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AssigneeSamsung Electronics Co., Ltd.
InventorHyun-woo Kim
Estimating the term…
A photosensitive polymer is provided which includes: (a) perfluoro-2,2-dimethy-1,3-dioxol derivatives having the following repeating unit: 1 and (b) vinyl derivatives having the following repeating unit: 2 , wherein R1 is H, Cl, or F; each of R2and R3 is H or F; R4 is H, F, CF3, OCF3, OCF2CF3, OCF2CF2CF3, CH2C(CF3)2OH, fluorinated alkyloxy group having an acid-labile group, n-perfluoroalkyl group having 1 to 8 carbon atoms, ORF, wherein RF is n-perfluoroalkyl group having 1 to 3 carbon atoms, or OQZ, wherein Q is perfluorinated alkylene group having 0 to 5 oxygen atoms, the sum of carbon atom and oxygen atom in the Q is 2 to 10, and Z is COOR, SO2F, CN, COF, or OCH3, wherein R is alkyl group having 1 to 4 carbon. A photoresist composition includes the photosensitive polymer and a photoacid generator(PAG).
A photosensitive polymer comprising:
A photosensitive polymer comprising:
A photosensitive polymer comprising:
A photoresist composition comprising:
Dependencies are inferred from the claim text.