Process and apparatus for treating contaminated gas

A process for treating a contaminated gas, comprising the following steps:

• continuously introducing a contaminated gas containing volatile organic compounds into a reactor;
• treating the contaminated gas by allowing the contaminated gas into the reactor to contact a metal oxide catalyst and an oxidant for a period of time to decrease the concentration of the volatile organic compounds;
• and
• continuously expelling the treated gas from the reactor;
• wherein the contaminated gas to be introduced has a humidity between 20% and 100% and a temperature of T° C., and the contaminated gas is heated to a temperature between (T+5)° C. and (T+70)° C. in the treating step.

A process for treating a contaminated gas, comprising the following steps:

• continuously introducing a contaminated gas containing ozone into a reactor;
• treating the contaminated gas by allowing the contaminated gas into the reactor to contact a metal oxide catalyst for a period of time to decrease the concentration of ozone;
• and
• continuously expelling the treated gas from the reactor;
• wherein the contaminated gas to be introduced has a humidity between 20% and 100% and a temperature of T° C., and the contaminated gas is heated to a temperature between (T+5)° C. and (T+70)° C. in the treating step.

An apparatus for treating a contaminated gas, comprising:

• an oxidant generator for generating an oxidant;
• a reactor for accommodating a metal oxide catalyst, a continuously introduced contaminated gas containing volatile organic compounds, the oxidant generated from the oxidant reactor, such that the concentration of the volatile organic compounds in the contaminated gas is decreased and the treated gas is continuously emitted from the reactor;
• a monitoring device for continuously monitoring a value of the emitted gas, the value being selected from the group consisting of the concentration of the organic compounds of the emitted gas, the concentration of the oxidant of the emitted gas, and a combination thereof;
• and
• a controlling device for controlling the oxidant feeding amount according to the monitored value.