Position detecting method and apparatus, exposure apparatus and device manufacturing method

Abstract

A position detector suitable for an exposure apparatus includes a reticle stage on which is provided a reticle-stage reference mark constituted by a substrate that exhibits a transmitting property with respect to alignment light. In alignment measurement, the relative position of the reticle-stage reference mark and a wafer alignment mark is detected. The relative position of a reticle reference mark and reticle alignment mark is measured beforehand using a separate detection mechanism, and the relative position of a reticle and wafer is decided from the relative position of the reticle-stage reference mark and wafer alignment mark.

Dependencies are inferred from the claim text.