Semiconductor exposure apparatus and method of driving the same
AssigneeSamsung Electronics Co., Ltd.
InventorSoon-Jong Park
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Abstract
A semiconductor exposure apparatus includes a light exposure portion irradiating light on a semiconductor wafer through a reticle; a pellicle particle detector detecting a particle existing on a surface of the reticle; a particle cleaner cleaning the reticle when the particle exists on the surface of the reticle; a robot arm moving the reticle to a desired location in response to a control signal generated from a main controller; and the main controller controlling an operation of the semiconductor exposure apparatus.
Claims13
A semiconductor exposure apparatus, comprising:
- a light exposure portion irradiating light on a semiconductor wafer through a reticle;
- a pellicle particle detector detecting a particle on a surface of the reticle;
- a particle cleaner cleaning the reticle when the particle is present on the surface of the reticle;
- a robot arm moving the reticle to a desired location in response to a control signal generated from a main controller;
- and
- the main controller controlling an operation of the semiconductor exposure apparatus.
A method of driving a semiconductor exposure apparatus, comprising:
- a) loading a reticle into a pelliticle particle detector;
- b) detecting a particle existing on the reticle using the pelliticle particle detector;
- c) moving the reticle to a cleaning location when the reticle exists on the reticle;
- d) moving a reticle cleaner to the reticle;
- and
- e) cleaning the reticle using the reticle cleaner.
Dependencies are inferred from the claim text.