Electrooptical apparatus, method of producing the same and electronic apparatus

An electrooptical apparatus, comprising:

• a pair of substrates;
• an electrooptical material disposed between the pair of substrates;
• a structure disposed on one of the pair of substrates, the structure including:
• a plurality of scanning lines;
• a plurality of data lines;
• thin-film transistors connected to the plurality of scanning lines and to the plurality of data lines, each of the thin-film transistors having a channel region;
• pixel electrodes connected to said thin-film transistors;
• an electrically-conductive light blocking film disposed such that at least the channel region of each of said thin-film transistors is covered with said light blocking film when viewed from the one of the pair of substrates;
• a plurality of image signal lines that supply an image signal;
• a sampling circuit that samples said image signal supplied via said plurality of image signal lines and supplies the resultant signals to said plurality of data lines;
• and
• relay interconnections connecting said image signal lines to said sampling circuit, a part of each of the relay interconnections being made of said light blocking film.

A method of producing an electrooptical apparatus that includes an electrooptical material disposed between a pair of substrates wherein, on one of the pair of substrates, there are provided:

• a plurality of scanning lines;
• a plurality of data lines;
• thin-film transistors connected to the plurality of scanning lines and to the plurality of data lines;
• pixel electrodes connected to the thin-film transistors;
• an electrically-conductive light blocking film disposed such that at least a channel region of each of said thin-film transistors is covered with said light blocking film when viewed from the one of the pair of substrates;
• a plurality of image signal lines that supply an image signal;
• and a sampling circuit that samples said image signals supplied via the plurality of image signal lines and supplies the resultant signals to the plurality of data lines;
• said method comprising the steps of:
• forming said light blocking film and first relay interconnections that connect said image signal lines to said sampling circuit using the same material;
• forming a first interlayer insulating film on said first relay interconnections and said light blocking film;
• forming said scanning lines on said first interlayer insulating film and also forming a second relay interconnection connected to said first relay interconnection via a contact hole formed in said first interlayer insulating film;
• forming a second interlayer insulating film on said scanning lines and said second relay interconnection;
• and
• forming said data lines connected to said thin-film transistors via contact holes formed in said second interlayer insulating film and also forming said image signal lines connected to said second relay interconnections.

A method of producing an electrooptical apparatus that includes an electrooptical material disposed between a pair of substrates wherein, on one of the pair of substrates, there are provided:

• a plurality of scanning lines;
• a plurality of data lines;
• thin-film transistors connected to the plurality of scanning lines and to the plurality of data lines;
• pixel electrodes connected to the thin-film transistors;
• an electrically-conductive light blocking film disposed such that at least a channel region of each of said thin-film transistors is covered with said light blocking film when viewed from the one of the pair of substrates;
• a plurality of image signal lines that supply an image signal;
• and a sampling circuit that samples said image signals supplied via the plurality of image signal lines and supplies the resultant signals to the plurality of data lines;
• said method comprising the steps of:
• forming said light blocking film and first relay interconnections that connect said image signal lines to said sampling circuit using the same material;
• forming a first interlayer insulating film on said first relay interconnections and said light blocking film;
• successively forming a plurality of films into a multilayer structure on said first interlayer insulating film, said plurality of films including a semiconductor layer acting as a source and drain of each of said thin-film transistors, a gate insulating film, and a gate electrode;
• forming a second interlayer insulating film on said gate electrode;
• and
• forming said data lines connected to said thin-film transistors via contact holes formed in said second interlayer insulating film and also forming image signal lines connected to said first relay interconnections via contact holes formed in said first and second interlayer insulating films.

A thin-film transistor array substrate:

• a plurality of data lines;
• a plurality of scanning lines intersecting the plurality of data lines;
• a plurality of thin-film transistors being disposed in correspondence with intersections of the plurality of data lines and the plurality of scanning lines, one of the plurality of thin film transistors having a channel region;
• a plurality of pixel electrodes being disposed in correspondence with the plurality of thin-film transistors;
• an electrically-conductive light blocking film disposed such that a least the channel region of each of the plurality of thin-film transistors is covered with the light blocking film;
• and
• at least one peripheral circuit including peripheral wirings wherein the peripheral wirings include a first wiring having a first conductive film which also forms the light blocking film and a second wiring including at least one of conductive films constituting the thin-film transistors, the data lines, and the scanning lines.

A thin-film transistor array substrate, comprising:

• a plurality of data lines;
• a plurality of scanning lines intersecting the plurality of data lines;
• a plurality of thin-film transistors being disposed in correspondence with intersections of the plurality of data lines and the plurality of scanning lines, one of the plurality of thin-film transistors having a channel region;
• a plurality of pixel electrodes being disposed in correspondence with the plurality of thin-film transistors;
• an electrically-conductive light blocking film disposed such that at least the channel region of each of the thin-film transistors is covered with the light blocking film;
• a plurality of image signal lines that supply an image signal;
• a sampling circuit that samples the image signal supplied via the plurality of image signal lines and supplies the resultant signals to the plurality of data lines;
• and
• relay interconnections connecting the image signal lines to the sampling circuit, a part of each of the relay interconnections being made of the light blocking film.

A method of producing a thin-film transistor array substrate that includes:

• a plurality of data lines;
• a plurality of scanning lines intersecting the plurality of data lines;
• a plurality of thin-film transistors being disposed in correspondence with intersections of the plurality of data lines and the plurality of scanning lines;
• a plurality of pixel electrodes being disposed in correspondence with the plurality of thin-film transistors;
• an electrically-conductive light blocking film disposed such that at least a channel region of each of the thin-film transistors is covered with the light blocking film;
• a plurality of image signal lines that supply an image signal;
• and
• a sampling circuit that samples the image signals supplied via the plurality of image signal lines and supplies the resultant signals to the plurality of data lines;
• the method comprising the step of:
• forming the light blocking film and a first relay interconnection that connect the image signal lines to the sampling circuit using the same material;
• forming a first interlayer insulating film above the first relay interconnection and the light blocking film;
• forming the scanning lines above the first interlayer insulating film and also forming a second relay interconnection connected to the first relay interconnection via a contact hole formed in the first interlayer insulating film;
• forming a second interlayer insulating film above the scanning line and the second relay interconnection;
• and
• forming the data line connected to the thin-film transistor via contact hole formed in the second interlayer insulating film and also forming the image signal line connected to the second relay interconnection.

A method of producing a thin-film transistor array substrate that includes:

• a plurality of data lines;
• a plurality of scanning lines intersecting the plurality of data lines;
• a plurality of thin-film transistors being disposed in correspondence with intersections of the plurality of data lines and the plurality of scanning lines;
• a plurality of pixel electrodes being disposed in correspondence with the plurality of thin-film transistors;
• an electrically-conductive light blocking film disposed such that at least a channel region of each of the thin-film transistors is covered with the light blocking film;
• a plurality of image signal lines that supply an image signal;
• and
• a sampling circuit that samples the image signals supplied via the plurality of image signal lines and supplies the resultant signals to the plurality of data lines;
• the method comprising the step of:
• forming the light blocking film and a first relay interconnection that connect the image signal line to the sampling circuit using the same material;
• forming a first interlayer insulating film above the first relay interconnection and the light blocking film;
• successively forming a plurality of films into a multiplayer structure above the first interlayer insulating film, the plurality of films including a semiconductor layer acting as a source and drain of the thin-film transistor, a gate insulating film, and a gate electrode;
• forming a second interlayer insulating film above the gate electrode;
• and
• forming the data line connected to the thin-film transistor via contact hole formed in the second interlayer insulating film and also forming image signal line connected to the first relay interconnection via contact hole formed in the first and second interlayer insulating film.