Polymer and photoresist compositions
AssigneeShipley Company, L.L.C.
InventorsCharles R. Szmanda, George G. Barclay, Peter Trefonas III, Wang Yueh
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Abstract
Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
Claims26
A polymer comprising as polymerized units one or more spirocyclic olefin monomers, wherein the spirocyclic olefin monomers are bound to the polymer backbone through the olefinic carbons, and optionally one or more ethylenically or acetylenically unsaturated monomers.
A method of polymerizing one or more spirocyclic olefinic monomers to form a polymer comprising as polymerized units one or more spirocyclic olefin monomers, comprising the step of contacting the one or more spirocyclic olefinic monomers with one or more catalysts selected from palladium(II) polymerization catalyst, nickel(II) polymerization catalyst or free radical polymerization catalyst.
A photoresist composition comprising a resin binder comprising as polymerized units one or more spirocyclic olefin monomers, wherein the spirocyclic olefin monomers are bound to the polymer backbone through the olefinic carbons, optionally one or more ethylenically or acetylenically unsaturated monomers and a photoactive component.
A compound of the formula
- 63
- wherein R1 and R3 are independently selected from hydrogen or (C1-C8)alkyl, R2=cyclohexyl or cyclopentyl, and R2 and R3 may be joined to form a 5- to 7-member fused ring.
Dependencies are inferred from the claim text.