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US 2002/0173253 A1Published application
Wafer carrier structure for chemical-mechanical polisher
AssigneeMacronix International Co., Ltd.
InventorChi-Feng Cheng
Life of this patent
Estimating the term…
Abstract
A wafer carrier structure for a chemical-mechanical polishing device. The wafer carrier structure includes a holder and a slurry supply pipeline. The slurry supply pipeline is attached to the side of the holder such that a portion of the supply pipeline near the outlet end is either parallel or perpendicular to the sidewall of the holder.
Claims14
A wafer carrier structure for a chemical-mechanical polishing device, comprising:
- a holder;
- and
- a slurry supply pipeline attached to the side of the holder, wherein a direction of the slurry supply pipeline near an outlet end thereof is parallel to a sidewall of the holder.
A wafer carrier structure for a chemical-mechanical polishing device, comprising:
- a holder;
- and
- a slurry supply pipeline attached to the side of the holder, wherein a direction of the slurry supply pipeline near an outlet end thereof is perpendicular to a sidewall of the holder.
Dependencies are inferred from the claim text.