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US 2002/0173235 A1Published application
Methods for break-in and conditioning a fixed abrasive polishing pad
OwnerVilas N. Koinkar, Reza Golzarian +4inventors
InventorsVilas N. Koinkar, Reza Golzarian, Matthew VanHanehem, Qiuliang Luo, James Shen, Peter A. Burke
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Abstract
The present invention relates to methods for break-in and conditioning polishing pads containing a fixed abrasive matrix. The polishing pads are useful for chemical-mechanical polishing (CMP). The present invention also relates to a method of determining the wear rate of a fixed abrasive polishing pad.
Claims18
A method of conditioning a fixed abrasive polishing pad, comprising:
- a. providing a fixed abrasive polishing pad;
- b. providing a conditioning element, wherein the element, comprises:
- an upper surface and a lower conditioning surface, comprising:
- abrasive particles;
- c. contacting the polishing pad and conditioning element;
- wherein one or both of the pad and conditioning element are in motion relative to the other.
3 more elements
Dependencies are inferred from the claim text.