Apparatus and method for forming aperture of vertical cavity surface emitting laser by selective oxidation
AssigneeSamsung Electronics Co., Ltd.
InventorsYoung-jin Song, Seung-ho Nam
Life of this patent
Estimating the term…
Loading patent…
AssigneeSamsung Electronics Co., Ltd.
InventorsYoung-jin Song, Seung-ho Nam
Estimating the term…
An apparatus and method for forming an aperture of a vertical cavity surface emitting laser (VCSEL) by selective oxidation, in which resonance peak variations during the formation of the aperture can be measured using an optical spectrum analyzer, so that the size of the aperture can be precisely adjusted. The aperture forming apparatus includes: a furnace having a first window and a second window for transmitting light, and a stage for supporting a wafer for the VCSEL with a pre-oxide layer where an aperture is to be formed; a light source placed outside the furnace, for emitting light through the first window onto the top of the wafer seated on the stage; and an optical spectrum analyzer for detecting the light intensity by receiving light reflecting from the top of the wafer for the VCSEL and passing through the second window.
An apparatus for forming an aperture of a vertical cavity surface emitting laser (VCSEL) by selective oxidation, comprising:
A method of forming an aperture of a vertical cavity surface emitting laser (VCSEL) by selective oxidation, comprising:
Dependencies are inferred from the claim text.