Thermal barrier layer and process for producing the same
AssigneeSiemens Westinghouse Power Corporation
InventorsDavid B. Allen, Ramesh Subramanian, Wolfram Beele
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Abstract
A device operable in a temperature environment in excess of about 1000° C. is provided. The device comprises a substrate and a ceramic thermal barrier layer deposited on at least a portion of the substrate. The layer is formed with a ternary or pseudoternary oxide having a pyrochlore or perovskite structure and a fugative material and having pores or other voluminous defects. The thermal barrier layer advantageously is abradable.
Claims20
A device operable in a temperature environment in excess of about 1000° C., the device comprising:
- a substrate;
- a ceramic thermal barrier layer deposited on at least a portion of the substrate, the layer formed with a ternary or pseudoternary oxide having a pyrochlore or perovskite structure and a fugitive material and having pores or other voluminous defects.
A device operable in a temperature environment in excess of about 1000° C., the device comprising:
- a substrate;
- a bondcoat deposited on at least a portion of the substrate;
- and
- an abradable ceramic thermal barrier layer deposited on at least a portion of the bondcoat, the layer formed with a ternary or pseudoternary oxide having a generally pyrochlore or perovskite structure and a fugitive material and having pores or other voluminous defects.
A method of forming a device operable in a temperature environment in excess of about 1000° C., the method comprising:
- providing a substrate;
- depositing a ceramic thermal barrier layer on at least a portion of the substrate, the layer formed with a ternary or pseudoternary oxide and a fugative material having a generally pyrochlore or perovskite structure by plasma spraying or by a PVD method.
Dependencies are inferred from the claim text.