US 2002/0172656 A1 · CLEANSING COMPOSITIONS

Cleansing compositions

OwnerKimberly Ann Biedermann, Jeffrey Michael Morgan +7inventors

InventorsKimberly Ann Biedermann, Jeffrey Michael Morgan, Karl Shiqing Wei, Mark Richard Sine, Cheyne P. Thomas, David Edmund Tarantino, Christopher (nmn) Irwin, Christopher Dean Putman, Peter William Beerse

Life of this patent

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Abstract

Disclosed are cleansing compositions having a pH of from about 2.0 to about 5.5, comprising an amphoteric surfactant in combination with 2-pyrrolidone-5 carboxylic acid as a proton donating agent. Also disclosed are corresponding articles of manufacture and methods of cleansing the skin using the described compositions. The compositions are mild to the skin and provide immediate and residual antimicrobial benefits to the skin.

Claims12

Dependent claims

A cleansing composition, comprising:

(a) from about 0.01% to about 40% by weight of an amphoteric surfactant;
(b) from about 0.1% to about 20% by weight of 2-pyrrolidone-5 carboxylic acid;
and
(c) from about 3% to about 99.89% by weight of an aqueous component,
wherein the cleansing composition has a pH in the range of about 2.0 to about 5.5.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

09/738,375Filed 15 Dec 2000

Priority

20 Jan 2000

Published

21 Nov 2002

Term ends

Not estimatedThe source records don’t support an estimate.

Classification28 codes

C11D 17/049
Combined with or containing other objects: cleaning or scouring pads; Wipes
A61K 8/0208
Characterised by special physical form: tissues; Wipes; Patches
A61K 8/40
Containing organic compounds: containing nitrogen
A61K 8/442
Aminocarboxylic acids or derivatives thereof, e.g. aminocarboxylic acids containing sulfur; Salts; Esters or N-acylated derivatives thereof:…

Family

Application60/177,091Us provisional application · filed 20 Jan 2000

Application60/177,092Us provisional application · filed 20 Jan 2000

Application60/191,939Us provisional application · filed 24 Mar 2000

US 2002/0172656 A1This patent

From the US filing history. Foreign family members aren’t listed.