Aligning apparatus and method for aligning mask patterns with regions on a substrate
AssigneeNikon Corporation
InventorKenji Nishi
Life of this patent
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Abstract
The present invention provides an alignment apparatus and method for successively bringing a plurality of shot regions to be processed on a substrate into alignment with a predetermined reference position. The invention performs a pre-alignment of the substrate and then repeatedly measures the position of wafer marks on selected preparatory sample shot regions using various coordinate systems. The invention determines the both the linear and rotational error in the position of the wafer marks relative to a predetermined reference position and determines the amount of movement of the substrate and reticle necessary to compensate for the error.
Claims10
A position detecting method that obtains positional information of a plurality of regions formed on a substrate, comprising the steps of:
- selecting a predetermined number of sample regions from the plurality of regions on the substrate;
- a first imaging step of imaging a mark having a predetermined shape that is arranged corresponding to a first region among the sample regions by using an imaging device, and then, based on a result of the imaging, re-imaging the mark by again using the imaging device, and obtaining positional information of the first region based on a result of the re-imaging;
- a second imaging step of imaging a mark having a shape that is approximately the same as the predetermined shape and that is arranged corresponding to a second region among the sample regions by using the imaging device, and obtaining positional information of the second region based on a result of the imaging by the imaging device without performing a re-imaging step;
- and
- performing a statistical calculation by using the positional information that is obtained, so as to obtain respective positional information of the plurality of regions formed on the substrate.
A position detecting method that obtains positional information of a plurality of regions formed on a substrate, comprising the steps of:
- selecting a predetermined number of sample regions from the plurality of regions on the substrate;
- a first imaging step of imaging a mark having a predetermined shape that is arranged corresponding to a first region among the sample regions by using an imaging device, correcting a result of the imaging based on unique error information of the imaging device, and then obtaining positional information of the first region in response to the corrected imaging result;
- a second imaging step of imaging a mark having a shape that is approximately the same as the predetermined shape and that is arranged corresponding to a second region among the sample regions by using the imaging device, and obtaining positional information of the second region based on a result of the imaging without performing a step of correcting the result of the imaging based on the unique error information of the imaging device;
- and
- performing a statistical calculation by using the positional information that was obtained, so as to obtain respective positional information of the plurality of regions formed on the substrate.
An exposure method that obtains positional information of a plurality of regions formed on a substrate and exposes a predetermined pattern in the plurality of regions based on the positional information that was obtained, comprising the steps of:
- selecting a predetermined number of sample regions from the plurality of regions on the substrate;
- a first imaging step of imaging a mark having a predetermined shape that is arranged corresponding to a first region among the sample regions by using an imaging device, and then, based on a result of the imaging, re-imaging the mark by again using the imaging device, and obtaining positional information of the first region based on a result of the re-imaging;
- a second imaging step of imaging a mark having a shape that is approximately the same as the predetermined shape and that is arranged corresponding to a second region among the sample regions by using the imaging device, and obtaining positional information of the second region based on a result of the imaging without performing a re-imaging step;
- and
- performing a statistical calculation by using the positional information that is obtained, so as to obtain respective positional information of the plurality of regions formed on the substrate.
An exposure method that obtains positional information of a plurality of regions formed on a substrate and exposes a predetermined pattern in the plurality of regions based on the positional information that was obtained, comprising the steps of:
- selecting a predetermined number of sample regions from the plurality of regions on the substrate;
- a first imaging step of imaging a mark having a predetermined shape that is arranged corresponding to a first region among the sample regions by using an imaging device, correcting a result of the imaging based on unique error information of the imaging device, and then obtaining positional information of the first region in response to the corrected imaging result;
- a second imaging step of imaging a mark having a shape that is approximately the same as the predetermined shape and that is arranged corresponding to a second region among the sample regions by using the imaging device, and obtaining positional information of the second region based on a result of the imaging without performing a step of correcting the result of the imaging based on the unique error information of the imaging device;
- and
- performing a statistical calculation by using the positional information that was obtained, so as to obtain respective positional information of the plurality of regions formed on the substrate.
Dependencies are inferred from the claim text.