Image classification method, obervation method, and apparatus thereof
AssigneeHitachi, Ltd.
InventorsRyo Nakagaki, Yuji Takagi, Takashi Hiroi, Masahiro Watanabe, Minori Noguchi, Kazuo Aoki
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AssigneeHitachi, Ltd.
InventorsRyo Nakagaki, Yuji Takagi, Takashi Hiroi, Masahiro Watanabe, Minori Noguchi, Kazuo Aoki
Estimating the term…
There are provided an automatic image collection apparatus and method capable of acquiring and automatically classifying fast an image of a defect part caused in a semiconductor wafer production process detected by a defect inspection unit. The image collection apparatus for automatically imaging and collecting images of a plurality of observed parts on a semiconductor wafer is provided with a scheduling portion for deciding the imaging order of the defects and stage moving velocities based on the positional relation of the plurality of observed parts on the wafer and a control portion for feed backing the stage movement amount to the beam deflection amount, thereby imaging and collecting images via an optimal route while moving the stage.
An image classification method comprising the steps of:
An image classification method comprising the steps of:
An image classification method comprising the steps of:
An image classification method comprising the steps of:
A method for observing a sample comprising the steps of:
An apparatus for observing a sample comprising:
An apparatus for observing a sample comprising:
An apparatus for observing a sample comprising:
Dependencies are inferred from the claim text.