Optical element producing method, base material drawing method and base material drawing apparatus
AssigneeKonica Corporation
InventorsKazumi Furuta, Yuichi Akanabe, Masahiro Morikawa, Osamu Masuda, Koji Horii, Tomohide Mizukoshi
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Abstract
A method of working an optical element for producing an optical element having a microscopic pattern, comprising a pattern drawing step for forming a specified pattern corresponding to said optical element on a base material including a layer of pattern drawing object, wherein said layer of pattern drawing object has a curved surface, and said specified pattern is drawn by the application of an electron beam to said layer of pattern drawing object.
Claims85
A method of working an optical element for producing an optical element having a microscopic pattern comprising the
- step of drawing a pattern, corresponding to an optical element, for forming a specified pattern on a base material including a layer on which a pattern is to be drawn, wherein
- said layer of pattern drawing object has a curved surface, and said specified pattern is drawn by the application of an electron beam to said layer of pattern drawing object.
A method of pattern drawing for forming a specified pattern on a base material including a layer of pattern drawing object comprising the step of
- carrying out the drawing of said specified pattern by applying an electron beam to said layer of pattern drawing object, wherein
- said layer of pattern drawing object has a curved surface.
A pattern drawing apparatus for forming a specified pattern on a base material having a layer of pattern drawing object comprising
- a moving means for moving the focus position of an electron beam with respect to said base material in accordance with said layer of pattern drawing object having a curved surface, and
- an electron beam applying means for carrying out the drawing of said specified pattern by applying an electron beam to said layer of pattern drawing object.
Dependencies are inferred from the claim text.