Methods and apparatus for forming submicron patterns on films
AssigneeUniversity of Massachusetts, a Massachusetts corporation
InventorsErik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
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Abstract
A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
Claims26
A method for forming a patterned film on a substrate, the method comprising:
- providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between;
- applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface;
- and
- hardening the structure in the first flowable medium to form the patterned film.
A method for producing a pattern on multiple substrates, each of the multiple substrates having at least one lower electrode, the method comprising:
- Providing a master defining the pattern, the master comprising at least one upper electrode;
- providing a first flowable medium on one of the substrates;
- positioning the master above the first flowable medium spaced from the first flowable medium by at least a second flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between;
- applying a voltage across at least one of the lower electrodes and at least one of the upper electrodes for a time sufficient to produce a structure in the first flowable medium along the interface;
- hardening the lateral structure in the first flowable medium to form the pattern;
- and
- using the same master, repeating the second providing step, the positioning step, the generating step, and the hardening step for additional ones of the substrates.
Dependencies are inferred from the claim text.