Method and apparatus for purifying a gas containing contaminants
AssigneeEbara Corporation
InventorToshiaki Fujii
Life of this patent
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Abstract
A method and an apparatus for purifying a gas containing contaminants are disclosed. The gas is irradiated with an ultraviolet ray and/or a radiation ray so as to produce microparticles of the contaminants. The resultant microparticles of the contaminants are contacted with a photocatalyst. Then, the photocatalyst is irradiated with light so as to decompose the contaminants held in contact with the photocatalyst. Organic compounds, organosilicon compounds, basic gas and the like can be decomposed by the action of the photocatalyst. Even when these species are present at a low concentration, they can be concentrated locally by transforming into microparticles, and hence can be removed.
Claims20
A method for purifying a gas containing a contaminant, comprising the steps of:
- irradiating the gas with an ultraviolet ray and/or a radiation ray for producing microparticles from the contaminant;
- contacting the contaminant in the form of microparticles with a photocatalyst;
- and
- irradiating the photocatalyst with a light for decomposing the contaminant being contact with the photocatalyst.
An apparatus for purifying a gas containing a contaminant, comprising:
- a microparticle-producing section having a source for emitting an ultraviolet ray and/or a radiation ray;
- and
- a decomposition section composed of a photocatalyst and a light source for irradiating said photocatalyst with light, said decomposition section being connected to said microparticle-producing section.
Dependencies are inferred from the claim text.