System and method for eliminating design rule violations during construction of a mask layout block
AssigneeDuPont Photomasks, Inc., a Delaware corporation
InventorsDan Rittman, Micha Oren
Life of this patent
Estimating the term…
Abstract
A system and method for eliminating design rule violations during construction of a mask layout block are disclosed. The method includes analyzing a selected position for a polygon in a mask layout block and obtaining one or more design rules associated with the polygon from a technology file. The method provides a hint area associated with the selected position for the polygon that graphically represents a space in the mask layout block where the selected position complies with the design rule violation.
Claims29
An automated method for eliminating design rule violations during construction of a mask layout block, comprising:
- analyzing a selected position for a polygon in a mask layout block;
- obtaining one or more design rules associated with the polygon from a technology file;
- and
- providing a hint area associated with the selected position for the polygon, the hint area operable to graphically represent a space in the mask layout block where the selected position complies with the design rules.
An automated method for eliminating design rule violations during construction of a mask layout block, comprising:
- analyzing a selected position of a polygon in a mask layout block;
- identifying a design rule violation in the mask layout block if the selected position is less than a design rule from a technology file;
- and
- automatically preventing the polygon from being placed in the mask layout block at the selected position if the design rule violation is identified.
A computer system for eliminating design rule violations during construction of a mask layout block, comprising:
- a processing resource;
- a computer readable memory;
- and
- processing instructions encoded in the computer readable memory, the processing instructions, when executed by the processing resource, operable to perform operations comprising:
- analyzing a selected position of a polygon in a mask layout block;
- identifying a design rule violation in the mask layout block if the selected position is less than a design rule from a technology file;
- and
- automatically preventing the polygon from being placed in the mask layout block at the selected position if the design rule violation is identified.
Software for eliminating design rule violations during construction of a mask layout block, the software being embodied in computer-readable media and when executed operable to:
- analyze a selected position of a polygon in a mask layout block;
- identify a design rule violation in the mask layout block if the selected position is less than a design rule from a technology file;
- and
- automatically prevent the polygon from being placed in the mask layout block at the selected position if the design rule violation is identified.
Dependencies are inferred from the claim text.