Chemical mechanical polisher with grooved belt
AssigneeApplied Materials, Inc.
InventorsChristopher W. Smith, John M. White
Life of this patent
Estimating the term…
Abstract
A chemical mechanical polishing apparatus has a substrate holder, a polishing belt, and a backing member positioned on a side of the polishing belt opposite the substrate holder. The polishing belt has a polishing surface to contact at least a portion of the substrate held by the substrate holder. The polishing belt is movable in a first direction in a generally linear path relative to the substrate. The polishing belt has a plurality of grooves formed therein.
Claims25
A chemical mechanical polishing apparatus, comprising:
- a substrate holder to hold a substrate;
- a polishing belt having a polishing surface to contact at least a portion of the substrate held by the substrate holder while the polishing belt is moving in a first direction in a generally linear path relative to the substrate, the polishing belt having a plurality of grooves formed therein, the grooves having a depth of at least about 0.02 inches, a width of at least about 0.015 inches, and a pitch of at least about 0.09 inches;
- and
- a backing member positioned on a side of the polishing belt opposite the substrate holder.
A chemical mechanical polishing apparatus, comprising:
- a substrate holder to hold a substrate;
- a polishing belt having a polishing surface to contact at least a portion of the substrate held by the substrate holder, the belt movable in a first direction in a generally linear path relative to the substrate, the polishing belt having a plurality of grooves formed therein, the grooves oriented substantially perpendicular to the first direction of motion;
- and
- a backing member positioned on a side of the polishing belt opposite the substrate holder.
A chemical mechanical polishing apparatus, comprising:
- a substrate holder to hold a substrate;
- a polishing belt having a polishing surface to contact at least a portion of the substrate held by the substrate holder, the polishing belt movable in a first direction in a generally linear path relative to the substrate, the polishing belt having a first plurality of substantially linear grooves and a second plurality of substantially linear grooves formed therein, the first plurality of grooves oriented substantially perpendicular to the second plurality of grooves;
- and
- a backing member positioned on a side of the polishing belt opposite the substrate holder.
A chemical mechanical polishing apparatus, comprising:
- a substrate holder to hold a substrate;
- a polishing belt having a polishing surface to contact at least a portion of the substrate held by the substrate holder, the polishing belt movable in a first direction in a generally linear path relative to the substrate, the polishing belt having a plurality of arcuate grooves formed therein, the grooves oriented substantially perpendicular to the first direction of motion;
- and
- a backing member positioned on a side of the polishing belt opposite the substrate holder.
Dependencies are inferred from the claim text.