Capacitor structures
OwnerLeonard Forbes, Kie Y. Ahn +1inventors
InventorsLeonard Forbes, Kie Y. Ahn, Jerome Michael Eldridge
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OwnerLeonard Forbes, Kie Y. Ahn +1inventors
InventorsLeonard Forbes, Kie Y. Ahn, Jerome Michael Eldridge
Estimating the term…
The invention includes a method of forming a capacitor structure. A first electrical node is formed, and a layer of metallic aluminum is formed over the first electrical node. Subsequently, an entirety of the metallic aluminum within the layer is transformed into one or more of AlN, AlON, and AlO, with the transformed layer being a dielectric material over the first electrical node. A second electrical node is then formed over the dielectric material. The first electrical node, second electrical node and dielectric material together define at least a portion of the capacitor structure. The invention also pertains to a capacitor structure which includes a first electrical node, a second electrical node, and a dielectric material between the first and second electrical nodes. The dielectric material consists essentially of aluminum, oxygen and nitrogen.
A method of forming a capacitor structure, comprising:
A method of forming a capacitor structure, comprising:
A capacitor structure, comprising:
Dependencies are inferred from the claim text.