Formation of multisegmented plated through holes
AssigneeInternational Business Machines Corporation
InventorsDonald S. Farquhar, Robert M. Japp, John M. Lauffer, Konstantinos I. Papathomas
Life of this patent
Estimating the term…
Loading patent…
AssigneeInternational Business Machines Corporation
InventorsDonald S. Farquhar, Robert M. Japp, John M. Lauffer, Konstantinos I. Papathomas
Estimating the term…
A method and structure relating to multisegmented plated through holes. A substrate includes a dielectric layer sandwiched between a first laminate layer and a second laminate layer. A through hole is formed through the substrate. The through hole passes through nonplatable dielectric material within the dielectric layer. As a result, subsequent seeding and electroplating of the through hole results in a conductive metal plating forming at a wall of the through hole on a segment of the first laminate layer and on a segment of the second laminate layer, but not on the nonplatable dielectric material of the dielectric layer. Thus, the conductive metal plating is not continuous from the first laminate layer to the second laminate layer.
A method for forming at least one multisegmented plated through hole (PTH) in a substrate, comprising the steps of:
A method for forming at least one multisegmented plated through hole (PTH) in a substrate, comprising the steps of:
An electrical structure, comprising:
An electrical structure, comprising:
Dependencies are inferred from the claim text.