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US 2002/0164069 A1Published application
Optical modeling device and exposure unit
AssigneeFuji Photo Film Co., Ltd.
InventorsKazuhiko Nagano, Yoji Okazaki
Life of this patent
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AssigneeFuji Photo Film Co., Ltd.
InventorsKazuhiko Nagano, Yoji Okazaki
Estimating the term…
When a first position of an exposure unit is determined by an XY positioning mechanism, a micromirror of a digital micromirror device is on/off controlled in accordance with image data within a region of a predetermined area including the first position, a light beam emitted from a light source enters the digital micromirror device, through an optical fiber and a homogenizer optical system, and modulated per each data in accordance with image data. A light beam transmitted to a reflective mirror is condensed by a condensing lens, then reflected from the reflected mirror onto a surface of a photo-curable resin, a portion within a region of a predetermined area of the photo-curable resin surface is exposed by the light beam, and the exposed portion is cured. In the same manner, the entire resin surface is exposed by repeating movement and/or exposure of the exposure unit.
An optical modeling device in which a light beam is exposed onto a photo-curable resin to form a three-dimensional model, the device comprising:
An optical modeling device in which a light beam is exposed onto a photo-curable resin to form a three-dimensional model, the device comprising:
An optical modeling device in which a light beam is exposed onto a photo-curable resin to form a three-dimensional model, the device comprising:
An optical mode ling device in which a light beam is exposed onto a photo-curable resin to form a three-dimensional model, the device comprising an exposure portion which includes a plurality of exposure units arranged in an array, each exposure unit scanning and exposing a plurality of pixels within a predetermined region of a surface of the photo-curable resin by using a light beam emitted from a light source and modulated for each pixel in accordance with image data.
An exposure unit for exposing a plurality of pixels, the unit comprising a light source, a condensing optical system for condensing a light beam emitted from the light source, and a deflecting element for modulating the light beam condensed by the condensing optical system for each pixel in accordance with image data.
An exposure unit for exposing a plurality of pixels, the unit comprising a light source, a condensing optical system for condensing a light beam which is emitted from the light source and is pulse-driven in picosecond pulses, and a deflecting element for modulating the light beam condensed by the condensing optical system for each pixel in accordance with image data.
Dependencies are inferred from the claim text.