Transfer apparatus and transfer method
AssigneeCanon Kabushiki Kaisha
InventorsYoshikiyo Yui, Masato Muraki
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Abstract
Alignment marks of partial transfer patterns on a transfer mask are measured. On the basis of these measured alignment marks, functions for determining the positions of the alignment marks and the scale magnification in the relative scanning direction are calculated. The start and end positions of transfer of the partial transfer patterns to an object of transfer are calculated, and the scale magnification for moving a mask stage is corrected. The mask stage and a wafer stage are moved to sequentially expose the partial transfer patterns.
Claims39
A transfer apparatus for transferring a transfer pattern of a transfer mask while moving the transfer mask and a substrate relative to each other, the transfer pattern being divided into a plurality of partial transfer patterns, and the transfer mask having a plurality of alignment marks for specifying positions of the plurality of partial transfer patterns, comprising:
- a measuring device for measuring all or some of the plurality of alignment marks;
- and
- a controller for determining a function indicating an arrangement of the plurality of partial transfer patterns on the basis of the measurements by said measuring device and, during transfer, moving a partial transfer mask to be transferred and the substrate relative to each other while aligning the transfer mask and the substrate in accordance with the function.
A transfer method of transferring a transfer pattern of a transfer mask while moving the transfer mask and a substrate relative to each other, the transfer pattern being divided into a plurality of partial transfer patterns, and the transfer mask having a plurality of alignment marks for specifying positions of the plurality of partial transfer patterns, comprising:
- a measurement step of measuring all or some of the plurality of alignment marks;
- and
- a control step of determining a function indicating an arrangement of the plurality of partial transfer patterns on the basis of the measurements in the measurement step and, during transfer, moving a partial transfer mask to be transferred and the substrate relative to each other while aligning the transfer mask and the substrate in accordance with the function.
A device fabrication method in which a transfer method of transferring a transfer pattern of a transfer mask while moving the transfer mask and a substrate relative to each other is applied to a lithography step, wherein the transfer pattern is divided into a plurality of partial transfer patterns, the transfer mask has a plurality of alignment marks for specifying positions of the plurality of partial transfer patterns, and
- said transfer method comprises:
- a measurement step of measuring all or some of the plurality of alignment marks;
- and
- a control step of determining a function indicating an arrangement of the plurality of partial transfer patterns on the basis of the measurements in the measurement step and, during transfer, moving a partial transfer mask to be transferred and the substrate relative to each other while aligning the transfer mask and the substrate in accordance with the function.
Dependencies are inferred from the claim text.