Phase grating image sensing device and method of manufacture
AssigneeUnited Microelectronics Corp.
InventorsChin-Wen Huang, Jian-Bin Shiu, Ching-Ming Lee
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Abstract
A phase grating image-sensing device. The device includes a plurality of photodiodes, a smoothing layer, a color filter layer and a plurality of phase gratings. The photodiodes are formed on a substrate and isolated from each other by isolation structures. The smoothing layer covers the photodiodes and the isolation structures. The color filter layer is embedded within the smoothing layer forming a sandwich structure with the smoothing layer. The phase gratings are formed over the smoothing layer positioned at corresponding locations above isolation structures. The phase grating layers produce a constructive interference of light passing through the smoothing layer.
Claims27
A phase grating imaging sensor, comprising:
- a plurality of photodiodes on a substrate;
- an isolation structure between every pair of neighboring photodiodes to isolate the photodiodes from each other;
- a smoothing layer over the photodiodes and the isolation structures;
- a color filter layer embedded within the smoothing layer and forming a sandwiched structure;
- and
- a plurality of phase gratings on a surface of the smoothing layer at corresponding locations relative to the isolation structures, wherein the phase gratings cause a constructive interference of light passing through the smoothing layer.
A phase grating imaging sensor, comprising:
- a plurality of photodiodes on a substrate;
- an isolation structure between every pair of neighboring photodiodes to isolate the photodiodes from each other;
- a smoothing layer over the photodiodes and the isolation structures;
- a color filter layer over the smoothing layer;
- and
- a plurality of phase gratings within a surface of the smoothing layer at corresponding locations relative to the isolation structures, wherein the phase gratings cause a constructive interference of light passing through the color filter layer.
A method of forming a phase grating image-sensing device, comprising:
- forming a plurality of photodiodes on a substrate;
- forming an isolation structure between neighboring photodiodes to isolate the photodiodes from each other;
- forming a first smoothing layer over the photodiodes and the isolation structures;
- forming a color filter layer over the first smoothing layer;
- forming a second smoothing layer over the color filter layer;
- forming a phase grating layer over the second smoothing layer;
- and
- patterning the phase grating layer to form a plurality of phase gratings, wherein the phase gratings cause a constructive interference of light passing through the color filer layer.
A method of forming a phase grating image-sensing device, comprising:
- forming a plurality of photodiodes on a substrate;
- forming an isolation structure between neighboring photodiodes to isolate the photodiodes from each other;
- forming a first smoothing layer over the photodiodes and the isolation structures;
- forming a phase grating layer over the first smoothing layer;
- patterning the phase grating layer to form a plurality of phase gratings;
- forming a second smoothing layer over the first smoothing layer so that the phase gratings are covered;
- and
- forming a color filter layer over the second smoothing layer, wherein the phase gratings cause a constructive interference of light passing through the color filer layer.
Dependencies are inferred from the claim text.