Multi-material target backing plate

An apparatus for a physical vapor deposition system comprising:

• a housing;
• a substrate support assembly;
• a target material flux region which produces backscatter particles;
• a target assembly comprising:
• a backing member constructed of a first material and having a central region and a flange radially extending from the central region and being adapted to support the target assembly within the physical vapor deposition system;
• a cover member disposed between the flange and the flux region, the cover member being constructed of a second material having a greater adhesiveness to the backscatter particles than the first material, the cover member being permanently secured to the flange;
• and
• a target member disposed between the central region and the flux region, the target member being constructed of a sputterable material;
• an insulative member electrically isolating the target assembly from the anode;
• and
• a shield disposed between the target member and the insulative member.

A method of manufacturing a target assembly for use in a physical vapor deposition system having a target material flux region which produces backscatter particles, the method comprising:

• permanently affixing a generally disc-shaped backing plate member having a proximate side and a distal side to a generally disc-shaped cover member having a proximate side and a distal side;
• the proximate side of the backing plate having a generally cylindrically-shaped extension portion centered on the axis of the backing plate and extending axially from the backing plate proximate side;
• the cover member having an opening centered on the axis of the cover member, the opening being adapted to mate with the extension portion of the backing plate;
• the proximate side of the backing plate member abutting the distal side of the cover member;
• the proximate side of the cover member and the extension portion of the backing plate being adapted to form a generally planar surface;
• the cover member being made of a material having a greater adhesiveness to the backscatter particles than the backing plate member;
• affixing one side of a generally disc-shaped target member to the generally planar surface formed by the proximate side of the cover member and the extension portion of the backing plate to form a target stock piece;
• and
• machining the target stock piece to form a target assembly adapted for use in the physical vapor deposition system, the target assembly having a portion of the cover member adapted to being exposed to the flux region.

A target assembly for a physical vapor deposition system having a target material flux region which produces backscatter particles, the target assembly comprising:

• a backing member constructed of a first material and being adapted to support the target assembly within the physical vapor deposition system;
• a cover member disposed between the backing member and the flux region so that no portion of the backing member is exposed to the flux region, the cover member being constructed of a second material having a greater adhesiveness to the backscatter particles than the first material, the cover member being permanently secured to the backing member;
• and
• a target member constructed of a sputterable material and disposed between the cover member and the flux region, the target member being permanently secured to the cover member.