Method and apparatus for creating radial profiles on a substrate
AssigneeSymyx Technologies, Inc.
InventorsYouqi Wang, C. Eric Ramberg
Life of this patent
Estimating the term…
Abstract
The gradient deposition method and apparatus permits a radial thickness or composition gradient on a substrate to be formed. The system comprises one or more deposition sources that can be fired sequentially or simultaneously. The system also comprises one or more dynamic shutters (e.g., shutters that can be moved independently of each other and during the deposition of a material) in combination with equipment that permits the substrate to be rotated during the deposition of the material onto the substrate. The system may also include one or more contact masks that may be placed on the substrate during the deposition in order to mask off particular portions of the substrate during the deposition process.
Claims65
An apparatus for creating a radial profile of a target material on a substrate, the apparatus comprising:
- a deposition source for directing a target material toward a substrate;
- a shutter that blocks an amount of the target material from striking the substrate;
- and
- a platform that holds the substrate;
- and
- wherein the substrate is rotated relative to the shutter during the deposition of the target material and the shutter blocks a predetermined amount of the target material to generate a radial profile.
A method for deposition a radial profile of a target material onto a substrate, the method comprising:
- directing target material toward a substrate;
- blocking some predetermined portion of the target material so that it does not strike the substrate;
- and
- rotating the substrate relative to the shutter while the target material is directed toward the substrate so that a radial profile is formed on the substrate.
A substrate comprising:
- a target material formed on top of the substrate, the target material having a radial profile;
- and
- wherein the radial profile of the target material on the substrate is formed using at least one shutter that blocks a predetermined amount of target material while the substrate is being rotated.
A radial gradient deposition apparatus comprising:
- a rotatable platform that rotates a substrate during deposition;
- a deposition source that directs target material toward the substrate;
- and
- a shutter that selectively blocks a varying amount of the target material directed toward the substrate to generate a radial thickness gradient on the substrate.
An apparatus for creating a radial profile of a target material on a substrate, the apparatus comprising:
- a deposition source for directing a target material toward a substrate;
- and
- a shutter that blocks an amount of the target material from striking the substrate, the shutter being rotated radially around the substrate during the deposition of the target material and the shutter blocks a predetermined amount of the target material to generate a radial profile.
Dependencies are inferred from the claim text.