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US 2002/0162572 A1Published application
Method for removing residual particles from a polished surface
OwnerHou-Hong Chou, Jiun-Fang Wanginventors
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Abstract
The present invention provides a method of removing residual particles from a polished surface. The method comprises the steps of: providing a substrate, forming a dielectric layer on the substrate, brush-cleaning and etching the dielectric layer on the substrate with a liquid when residual particles are trapped therein, whereby the residual particles are loosened and then relocated to the dielectric layer, and finally cleaning the dielectric layer to remove the relocated residual particles.
Claims17
A method for removing residual particles from a polished surface comprising the steps of:
- providing a substrate;
- forming a dielectric layer on the substrate;
- brush-cleaning and etching the dielectric layer on the substrate with a liquid when the residual particles are trapped in the dielectric layer, whereby the residual particles are loosened and then relocated to the dielectric layer;
- and
- further cleaning the dielectric layer to remove the relocated residual particles thereon.
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Dependencies are inferred from the claim text.