Method of rapid prevention of particle pollution in pre-clean chambers

Abstract

A method for rapid preventing particles in a pre-clean chamber according to the invention includes a silica material supply step for providing a silica material in the pre-clean chamber, a gas supply step for providing oxygen gas and sputtering gas into the pre-clean chamber, and a plasma generating step for ionizing the oxygen gas and the sputtering gas by RF to form plasma and then impacting the plasma onto the silica material, so that the silica dislodged from the silica material and it reacts with the ionized oxygen at a time so as to form a silicon oxide layer rapidly on the bell-jar in the pre-clean chamber. The method of the invention prevents the silicon-rich oxide from peeling quickly so as to extend the life of the bell-jar.

Dependencies are inferred from the claim text.