Vacuum processing method
AssigneeCanon Kabushiki Kaisha
InventorsHitoshi Murayama, Toshiyasu Shirasuna, Hiroaki Niino, Makoto Aoki
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Abstract
A vacuum processing method comprises placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers admitted into the reaction container from the high-frequency electrode so as to process the article to be processed. In the method, at least the high-frequency power having a frequency f1 and the high-frequency power having a frequency f2 are used and satisfy the following two conditions as the high-frequency powers. 250 MHz≧f1>f2≧10 MHz 0.9≧f2/f1≧0.1
Claims14
A vacuum processing method, comprising placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high-frequency electrode to generate plasma in said reaction container by the high-frequency powers admitted into said reaction container from the high-frequency electrode so as to process said article to be processed, wherein at least the high-frequency power having a frequency f1 and the high-frequency power having a frequency f2 are used and satisfy the following two conditions as said high-frequency powers:
- 250 MHz≧f1>f2≧10 MHz 0.9≧f2/f1≧0.1.
Dependencies are inferred from the claim text.