Benomyl tolerant fusarium lateritium and uses thereof
OwnerDavid E. Block, Jean S. Vandergheynstinventors
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Abstract
The invention provides methods for treating a plant having an exposed wound to increase resistance against a plant pathogen, by applying an effective amount of a benomyl solution, in conjunction with inoculating the pruning wound with a fungal organism resistant to the benomyl concentration. The invention also provides a benomyl tolerant F. lateritium which is particularly adapted for the treatment of grapevine pruning wounds to control Eutypa dieback.
Claims37
A method for treating a plant to increase resistance against a plant pathogen, said method comprising the steps of:
- a) applying to a wound of said plant a benomyl solution having a concentration of greater than about 2 μg/ml benomyl, and
- b) inoculating said wound with cells of a fungal organism which is an antagonist to said plant pathogen,
- wherein said fungal organism is resistant to said benomyl concentration.
In a method for treating a plant for resistant against pathogens, said method comprising applying benomyl to an exposed wound of said plant in a solution having a concentration of greater than about 2 μg/ml benomyl,
- the improvement comprising adding to said solution cells of a fungal organism is resistant to said benomyl concentration.
A strain of F. lateritium tolerant to a concentration of greater than about 2 μg/ml benomyl.
A biological control composition for application to a wounded site of a plant, said composition comprising cells of at least one fungal organism capable of growth at a benomyl concentration of greater than about 2 μg/ml, and which is an antagonist to a plant fungal pathogen,
- and a dispersal medium for applying said composition to said wounded site.
A method for obtaining a beneficial fungal organism resistant to benomyl, said method comprising the steps of:
- a) exposing cells of said organism to a mutagen;
- b) growing mutated cells of said organism on a culture medium comprising a low benomyl concentration of less than about 50 μg/ml benomyl;
- c) selecting mutated cells capable of growing on said medium;
- d) transferring said mutated cells onto culture medium onto culture medium having a high benomyl concentration of greater than about 50 μg/ml benomyl;
- and
- e) selecting benomyl resistant strains capable of growing on said high benomylo concentration mudium.
Dependencies are inferred from the claim text.