Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases

A thermal oxidation reactor for abatement of oxidizable halogen components in an effluent gas, said thermal oxidation reactor comprising:

• a housing defining a flow passage therein for flow of effluent gas therethrough;
• an inlet coupled to the housing for introduction of effluent gas to the central flow passage, said inlet comprising (1) a shrouding gas flow passage arranged to flow shrouding gas into the central flow passage cocurrently with the effluent gas and surrounding the effluent gas, and (2) a reagent gas flow passage arranged to flow a reagent gas into the central flow passage cocurrently with the shrouding gas and surrounding the shrouding gas, wherein the reagent gas is reactive with halogen species in the effluent gas, with said central flow passage being of sufficient length downstream of the inlet to permit the reagent gas to mix and react with the halogen species of the effluent gas.