Spectroscopic ellipsometer with adjustable detection area
AssigneeHoriba, Ltd.
InventorToyoki Kanzaki
Life of this patent
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Abstract
A spectroscopic ellipsometer is provided for measuring a small target surface with a high degree of precision. An irradiating optical system provides a polarized light to the surface of the target, while a detecting optical system is provided with a higher F-number for collecting the reflected light from the target surface to introduce it into the spectrometer for measuring a thickness of a thin film on the surface of the sample in accordance with the polarization state of change of the detected light rays.
Claims14
In a spectroscopic ellipsometer having an irradiating optical system for irradiating a target and a detecting optical system for collecting the reflected light and providing the reflected light to a spectrometer, the improvement comprising:
- a F-number for the irradiating optical system is lower than a F-number for the detecting optical system.
A spectroscopic ellipsometer comprising:
- an irradiating optical system for irradiating a target;
- a detecting optical system for collecting the reflected light;
- and a spectrometer unit for analyzing the collected light, wherein
- a F-number for the irradiating optical system is lower than a F-number for the detecting optical system.
A spectroscopic ellipsometer comprising:
- an irradiating optical system includes a pair of concave reflectors and a polarizer unit to provide a linear polarized light ray beam to a target;
- a detecting optical system includes a variable aperture marking member, an analyzer, and a pair of concave reflectors for collecting elliptically polarized collected light from the target;
- and
- a spectrometer unit for analyzing a polarization state change of elliptically polarized collected light.
Dependencies are inferred from the claim text.