High resolution maskless lithography field lens for telecentric system
AssigneeBall Semiconductor, Inc.
InventorsWenhui Mei, Takashi Kanatake
Life of this patent
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Abstract
A system for performing digital lithography onto a subject is provided. The system includes a telecentric lens system that utilizes a field lens for redirecting light without distortion. The field lens may be utilized with a microlens array, a grating, and other lenses to achieve a desired result. A Fresnel lens may be used in place of the field lens and may be combined with the microlens array into a diffraction optical element.
Claims21
A system for performing digital lithography on a subject, the system comprising:
- a point array for generating a digital pattern, the point array having a plurality of array elements operable to direct a plurality of lights representing the digital pattern towards a telecentric lens system;
- and
- the telecentric lens system, the lens system operable to receive the plurality of lights from the point array and direct the digital pattern towards the subject, the lens system including:
- a first lens operable to direct the received light towards a second lens, the first lens operable to perform transformations on the received light;
- and
- a second lens for receiving light from the first lens and redirecting the light towards the subject without distortion.
A system for performing digital lithography on a subject, the system comprising:
- a point array for generating a digital pattern, the point array having a plurality of array elements operable to direct a plurality of lights representing the digital pattern towards a telecentric lens system;
- and
- the telecentric lens system, the lens system operable to receive the plurality of lights from the point array and direct the digital pattern towards the subject, the lens system including:
- an image lens operable to receive the plurality of lights from the point array and to perform transformations on the received light;
- a microlens array operable to receive the plurality of lights from the image lens and to focus the lights;
- and
- a field lens operable to receive the focused plurality of lights from the microlens array and to direct the light towards the subject without perspective distortion.
A method for performing digital lithography on a subject using a telecentric lens system, the method comprising:
- directing a plurality of individual light elements representing a digital pattern towards the telecentric lens system;
- altering a property of the digital pattern using a first lens of the telecentric lens system;
- and
- redirecting the digital pattern without distortion towards the subject using a second lens of the telecentric lens system, so that the digital pattern is projected onto the subject without perspective distortion.
An optical diffraction element comprising:
- a translucent substrate;
- and
- a plurality of translucent concentric circles formed on the substrate, wherein each concentric circle comprises:
- a first edge comprising a plurality of steps, wherein the steps ascend relative to the substrate at a first angle;
- a second edge, wherein the second edge ascends relative to the substrate at a second angle that is greater than the first angle;
- and
- a plateau portion forming an upper side of the circle relative to the substrate and connecting the first and second edges.
A method for making an optical diffraction element, the method comprising:
- forming a translucent base;
- applying a first concentric circle onto the base;
- and
- applying at least a second concentric circle onto the first concentric circle, wherein a width of the second concentric circle is less than a width of the first concentric circle, so that a stepped slope is formed up at least one side of the optical diffraction element.
Dependencies are inferred from the claim text.