Liquid crystal display device and manufacturing method of same

A method for manufacturing a liquid crystal display comprising:

• a process of sequentially forming a metal layer, a gate insulating film, and a semiconductor layer, in this order, on a transparent insulating substrate and forming, by using a photoresist having a plurality of regions each having a different thickness which has been formed by changing an integration value of an amount of exposure for every specified region, a stacked-layer film made up of a gate electrode, said gate insulating film, and a semiconductor layer each having a same shape as said gate electrode, and a scanning line and a terminal portion lower layer metal film;
• a process of forming a signal line after having formed a protective film on an entire surface of said transparent insulating substrate;
• a process of forming a first insulating film on an entire surface of said transparent insulating substrate and forming convex and concave portions in a display region;
• a process of forming a second insulating film on an entire surface of said transparent insulating substrate and forming contact holes in places facing each other on said semiconductor layer and in said second insulating film on a signal line existing in a vicinity and, at a same time, of removing at least said second insulating film on said terminal portion lower layer metal film;
• a process of forming contact holes in places facing each other on said semiconductor layer and in said protective film on said terminal portion lower layer metal film;
• a process of doping said semiconductor layer with an element having a valence of V through said contact hole formed in said protective film to form a source region and a drain region;
• and
• a process of integrally forming a source electrode and a reflective electrode to be connected to said source region and a drain electrode to be connected to said drain region, and a connecting electrode connecting said drain electrode to said signal line, all of which are made up of both a metal having a high melting point and an alloy mainly containing Al being formed and stacked in a layer on said metal having a high melting point.

A method for manufacturing a liquid crystal display comprising:

• a step of sequentially forming a metal layer, a gate insulating film, and a semiconductor layer, in this order, on a transparent insulating substrate and then forming, by using a photoresist having a plurality of regions each having a different thickness which has been formed by changing an integration value of an amount of exposure for every specified region, a stacked-layer film made up of a gate electrode, said gate insulating film, and a semiconductor layer each having a same shape as said gate electrode, and a scanning line and a terminal portion lower layer metal film;
• a process of forming a signal line after having formed a protective film on an entire surface of said transparent insulating substrate;
• a process of forming a first insulating film on an entire surface of said transparent insulating substrate and forming convex and concave portions in a display region;
• a process of forming a second insulating film on an entire surface of said transparent insulating substrate and forming contact holes in places facing each other on said semiconductor layer and in said second insulating film on a signal line existing in a vicinity and, at a same time, of removing at least said second insulating film on said terminal portion lower layer metal film;
• a process of forming a pixel electrode made up of a transparent conductive film;
• a process of forming contact holes in places facing each other on said semiconductor layer and in said protective film on said terminal portion lower layer metal film;
• a process of doping said semiconductor layer with an element having a valence of V through said contact hole formed in said protective film to form a source region and a drain region;
• and
• a process of integrally forming a source electrode to be connected to said source region and a reflective electrode to be connected to said pixel electrode, a drain electrode to be connected to said drain region, and a connecting electrode connecting said drain electrode to said signal line, all of which are made up of both a metal having a high melting point and an alloy mainly containing Al being formed and stacked in a layer on said metal having a high melting point.

A method for manufacturing a liquid crystal display comprising:

• a process of forming a gate electrode, a scanning line, and a terminal portion lower layer metal film on a transparent insulating substrate;
• a process of sequentially forming a gate insulating film, a semiconductor layer, and a metal layer in this order, on said transparent insulating substrate and then forming, by using a photoresist having a plurality of regions each having a different thickness which has been formed by changing an integration value of an amount of exposure for every specified region, a semiconductor layer after having formed a source electrode, a drain electrode, and a signal line;
• a process of forming a passivation film on an entire surface of said transparent insulating substrate and then a first insulating film and forming convex and concave portions in a display region;
• a process of forming a second insulating film on an entire surface of said transparent insulating substrate and forming contact holes in said second insulating film on said source electrode and, at a same time, of removing at least said second insulating film on said terminal portion lower layer metal film;
• a process of forming contact holes in said passivation film over said source electrode and said terminal portion lower layer metal film;
• and
• a process of simultaneously forming a reflective electrode to be connected to said source electrode made up of an alloy mainly containing Al or of both a metal having a high melting point and an alloy mainly containing Al being formed and stacked on said metal having a high melting point.

A method for manufacturing a liquid crystal display comprising:

• a process of forming a gate electrode, a scanning line, and a terminal portion lower layer metal film on a transparent insulating substrate;
• a process of sequentially forming a gate insulating film, a semiconductor layer, and a metal layer in this order and then forming, by using a photoresist having a plurality of regions each having a different thickness which has been formed by changing an integration value of an amount of exposure for every specified region, a semiconductor layer after having formed a source electrode, a drain electrode, and a signal line;
• a process of forming a passivation film on an entire surface of said transparent insulating substrate and then a first insulating film and then forming convex and concave portions in a display region;
• a process of forming a second insulating film on an entire surface of said transparent insulating substrate and forming contact holes in said second insulating film over said source electrode and, at a same time, of removing at least said second insulating film on said terminal portion lower layer metal film;
• a process of forming a pixel electrode made up of a transparent conductive film;
• a process of forming contact holes in said source electrode and in said passivation film over said terminal portion lower layer metal film;
• and
• a process of forming said source electrode and said reflective electrode to be connected to said reflective electrode both being made up of both a metal having a high melting point and an alloy mainly containing Al being formed and stacked in a layer on said metal having a high melting point.