Power supply with flux-controlled transformer
AssigneeAdvanced Energy Industries, Inc.
InventorsDmitri Kovalevski, Michael Kishinevsky, David J Christie
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Abstract
There is provided by this invention an apparatus and method for generating voltage pulses to first and second magnetron devices in a plasma chamber. An isolation transformer is connected to a pulsed DC power supply having a flux sensor, such as a Hall effect sensor, in close proximity to its air gap to monitor the transformer flux. A control circuit is connected to the flux sensor to control the duty cycle of the transformer by controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.
Claims6
A power supply for generating voltage pulses to first and second magnetron devices in a plasma chamber, comprising:
- a source of pulsed DC electrical power connected to the primary of an isolation transformer;
- the secondary output of the transformer is connected to first and second magnetron sputtering devices;
- a flux sensor disposed to detect the flux in the transformer core;
- and
- a control circuit connected to the flux sensor to control the duty cycle of the transformer to prevent saturation.
A method of supplying pulsed DC power to first and second magnetron devices in a plasma chamber comprising the steps of:
- generating DC voltage pulses;
- supplying the DC voltage pulses to the primary of an isolation transformer;
- connecting the output of the isolation transformer to first and second magnetron devices in a plasma chamber;
- detecting the flux of the isolation transformer;
- and
- controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.
Dependencies are inferred from the claim text.