Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device
OwnerNaoya Hayamizuinventor
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Abstract
In an ultrasonic washing method of washing a thing to be washed by supplying ultrasonic-wave-applied cleaning fluid to the thing, the ultrasonic wave is applied to the cleaning fluid in such a manner that the ultrasonic wave is turned on and off repeatedly at specific time intervals.
Claims18
An ultrasonic washing method of washing a thing to be washed by supplying ultrasonic-wave-applied cleaning fluid to the thing, said ultrasonic washing method comprising applying said ultrasonic wave to said cleaning fluid in such a manner that said ultrasonic wave is turned on and off repeatedly at specific time intervals.
A washing method comprising:
- a first step of washing a thing to be washed by applying a first ultrasonic wave;
- and
- a second step of washing the thing by applying a second ultrasonic wave.
A semiconductor device manufacturing method comprising:
- a first step of washing a surface at which a pattern including an island-like structure with a width of 0.2 μm or less and an aspect ratio of 1.0 or more has been formed by applying a first ultrasonic wave;
- and
- a second step of applying a second ultrasonic wave for washing.
A semiconductor device manufacturing method comprising:
- a first step of washing a surface at which metal wires are exposed by applying a first ultrasonic wave;
- and
- a second step of applying a second ultrasonic wave for washing.
A method of manufacturing matrix-type display devices, comprising:
- a first step of washing a surface at which Si or metal wires are exposed by applying a first ultrasonic wave;
- and
- a second step of applying a second ultrasonic wave for washing.
Dependencies are inferred from the claim text.