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US 2002/0157609 A1Published application
Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method
AssigneeNissin Electric Co., Ltd.
InventorKoji Miyake
Life of this patent
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Abstract
A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil power source for reversing a coil current to be fed to the magnetic coils, and a control unit for controlling the coil power source to reverse the flowing direction of the coil current.
Claims12
A vacuum arc vapor deposition apparatus comprising:
- a film forming chamber containing a substrate and being vacuum discharged;
- a vacuum arc evaporating source for producing a plasma containing a cathode material by vaporizing a cathode by vacuum arc discharge;
- a magnetic coil for generating a magnetic field for deflecting or converging said plasma produced by said vacuum arc evaporating source, and guiding said plasma to the vicinity of said substrate within said film forming chamber;
- a coil power source for feeding a coil current for generating said magnetic field to said magnetic coil, said coil power source reversing a flowing direction of the coil current fed to said magnetic coil;
- and
- a control unit for controlling said coil power source to reverse the flowing direction of the coil current fed to said magnetic coil.
3 more elements
A vacuum arc vapor deposition method comprising;
- producing a plasma containing a cathode material by vaporizing a cathode by vacuum arc discharge;
- feeding a coil current for generating a magnetic field to a magnetic coil to deflect or converge said plasma thus produced and guide said plasma to the vicinity of a substrate;
- and
- reversing a flowing direction of the coil current fed to the magnetic coil.
1 more element
Dependencies are inferred from the claim text.